Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Name: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Price: 121.95 EUR
Availability: BackOrder
ISBN: 9789811500459

Guilei Wang

Springer Verlag, Singapore, 2019

121,95 €On orderDelivery: 2-3 weeks

Quantity

ISBN-13: 9789811500459
ISBN-10: 9811500452
Publisher: Springer Verlag, Singapore
Year: 2019
Publication date: 2019-10-02
Pages: 115
Dimensions: 235x155x