Reactive Sputter Deposition
Springer-Verlag Berlin and Heidelberg GmbH & Co. KG, 2008
382,50 €On orderDelivery: 2-3 weeks
In the family of Physical Vapour Deposition techniques, sputtering is one of the most important. This book describes various aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth allowing the reader to understand the complete process.
- ISBN-13
- 9783540766629
- ISBN-10
- 3540766626
- Publisher
- Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
- Year
- 2008
- Publication date
- 2008-04-24
- Pages
- 572
- Dimensions
- 241x162x45
- Weight
- 1134