Spacer Engineered FinFET Architectures
Brajesh Kumar Kaushik, Pankaj Kumar Pal, Sudeb Dasgupta
Taylor & Francis Inc, 2017
259,95 €On orderDelivery: 2-3 weeks
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
- ISBN-13
- 9781498783590
- ISBN-10
- 1498783597
- Publisher
- Taylor & Francis Inc
- Year
- 2017
- Publication date
- 2017-06-06
- Pages
- 154
- Dimensions
- 161x241x16
- Weight
- 384