Atomic Layer Deposition for Semiconductors
Springer-Verlag New York Inc., 2016
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This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.
- ISBN-13
- 9781489979438
- ISBN-10
- 1489979433
- Publisher
- Springer-Verlag New York Inc.
- Year
- 2016
- Publication date
- 2016-08-23
- Pages
- 263
- Dimensions
- 155x234x18
- Weight
- 482