Applications of Silicon-Germanium Heterostructure Devices

C.K (Indian Institute of Technology, Kharagpur, India) Maiti, G.A (The Queen's University of Belfast, UK) Armstrong

Taylor & Francis Ltd, 2001

437,75 €On orderDelivery: 2-3 weeks

Deals with the design and optimization of transistors made from strained layers. This book covers key technology issues for the growth of strained layers, background theory of the HBT, and how device simulation can be used to predict the optimum HBT device structure for a particular application such as cryogenics.

ISBN-13
9780750307239
ISBN-10
0750307234
Publisher
Taylor & Francis Ltd
Year
2001
Publication date
2001-07-20
Pages
414
Dimensions
234x156x
Weight
449