Plasma Processes for Semiconductor Fabrication
W. N. G. Hitchon
Cambridge University Press, 1999
198,25 €On orderDelivery: 2-3 weeks
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
- ISBN-13
- 9780521591751
- ISBN-10
- 0521591759
- Publisher
- Cambridge University Press
- Year
- 1999
- Publication date
- 1999-01-28
- Pages
- 232
- Dimensions
- 259x180x18
- Weight
- 650