Plasma Processes for Semiconductor Fabrication
W. N. G. Hitchon
Cambridge University Press, 2005
117,25 €On orderDelivery: 2-3 weeks
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
- ISBN-13
- 9780521018005
- ISBN-10
- 0521018005
- Publisher
- Cambridge University Press
- Year
- 2005
- Publication date
- 2005-09-29
- Pages
- 232
- Dimensions
- 254x178x15
- Weight
- 440