Computational Lithography
Gonzalo R. Arce, Xu Ma
John Wiley & Sons Inc, 2010
150,50 €On orderDelivery: 2-3 weeks
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.
- ISBN-13
- 9780470596975
- ISBN-10
- 047059697X
- Publisher
- John Wiley & Sons Inc
- Year
- 2010
- Publication date
- 2010-08-06
- Pages
- 256
- Dimensions
- 241x160x18
- Weight
- 508